- chemical gas-phase deposition
- Макаров: химическое осаждение из газовой фазы
Универсальный англо-русский словарь. Академик.ру. 2011.
chemical gas-phase deposition
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Chemical beam epitaxy — (CBE) forms an important class of deposition techniques for semiconductor layer systems, especially III V semiconductor systems. This form of epitaxial growth is performed in an ultrahigh vacuum system. The reactants are in the form of molecular… … Wikipedia
Chemical vapor deposition — DC plasma (violet) enhances the growth of carbon nanotubes in this laboratory scale PECVD apparatus. Chemical vapor deposition (CVD) is a chemical process used to produce high purity, high performance solid materials. The process is often used in … Wikipedia
Gas — This article is about the physical properties of gas as a state of matter. For the uses of gases, and other meanings, see Gas (disambiguation). Ga … Wikipedia
chemical element — Introduction also called element, any substance that cannot be decomposed into simpler substances by ordinary chemical processes. Elements are the fundamental materials of which all matter is composed. This article considers the… … Universalium
Phase transition — This diagram shows the nomenclature for the different phase transitions. A phase transition is the transformation of a thermodynamic system from one phase or state of matter to another. A phase of a thermodynamic system and the states of matter… … Wikipedia
Chemical Vapour Deposition — Unter dem Begriff chemische Gasphasenabscheidung (englisch chemical vapor deposition, CVD) versteht man eine Gruppe von Beschichtungsverfahren, welche unter anderem bei der Herstellung von mikroelektronischen Bauelementen eingesetzt werden.… … Deutsch Wikipedia
Chemical vapor deposition — Unter dem Begriff chemische Gasphasenabscheidung (englisch chemical vapor deposition, CVD) versteht man eine Gruppe von Beschichtungsverfahren, welche unter anderem bei der Herstellung von mikroelektronischen Bauelementen eingesetzt werden.… … Deutsch Wikipedia
Chemical vapour deposition — Unter dem Begriff chemische Gasphasenabscheidung (englisch chemical vapor deposition, CVD) versteht man eine Gruppe von Beschichtungsverfahren, welche unter anderem bei der Herstellung von mikroelektronischen Bauelementen eingesetzt werden.… … Deutsch Wikipedia
chemical vapor deposition — noun : a technique for depositing a usually thin solid layer of a substance on a surface as the result of vapor phase chemical reactions in a high temperature gas in close proximity to the surface … Useful english dictionary
Thin-film deposition — is any technique for depositing a thin film of material onto a substrate or onto previously deposited layers. Thin is a relative term, but most deposition techniques allow layer thickness to be controlled within a few tens of nanometers, and some … Wikipedia
Hybrid Physical-Chemical Vapor Deposition — (HPCVD) is a thin film deposition technique that combines physical vapor deposition (PVD) with chemical vapor deposition (CVD). For the instance of magnesium diboride (MgB2) thin film growth, HPCVD process uses diborane (B2H6) as the boron… … Wikipedia
